Chinese Physics C > 2005, Vol. 29 > Issue(S1): 80-83

Grazing Exit X-Ray Fluorescence Spectroscopy

Institute of High Energy Physics, CAS, Beijing 100049, China2 Institute of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China

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Abstract：
In this paper, A grazing exit X-ray fluorescence spectroscopy for thin film analysis was developed by Institute of High Energy Physics, Chinese Academy of Sciences. GEXRF is a new method of instrumental analysis that not only allows determination of the film composition, but also provides information on depth distributions and densities, thickness of films. With grazing-emission X-ray fluorescence, the opposite principle of total reflection X-ray fluorescence is utilized. In this study, X-ray fluorescence (XRF) experiments have been performed for metal thin films (Ni, Ni/Ti) on silicon substrates and a mirror-polished GaAs under the grazing exit condition. The XRF intensity was measured as a function of the exit angle for nearly normal X-ray incidence. The angular dependence of the grazing exit XRF intensity showed a sharp increase at the critical angle of K _α, K _βradiation for the metal film. The applicability of the grazing exit XRF for thin-film analysis was clearly demonstrated.

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XU Qing, WEI Xiang-Jun, HUANG Yu-Ying and HE Wei. Grazing Exit X-Ray Fluorescence Spectroscopy[J]. Chinese Physics C, 2005, 29(S1): 80-83.

XU Qing, WEI Xiang-Jun, HUANG Yu-Ying and HE Wei. Grazing Exit X-Ray Fluorescence Spectroscopy[J]. Chinese Physics C, 2005, 29(S1): 80-83. shu

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Received: 2005-10-28
Revised: 1900-01-01

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通讯作者:陈斌, bchen63@163.com

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沈阳化工大学材料科学与工程学院沈阳 110142

Grazing Exit X-Ray Fluorescence Spectroscopy

Corresponding author:XU Qing,

Institute of High Energy Physics, CAS, Beijing 100049, China2 Institute of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China

Received Date:2005-10-28

Accepted Date:1900-01-01

Available Online:2005-01-02

Abstract:In this paper, A grazing exit X-ray fluorescence spectroscopy for thin film analysis was developed by Institute of High Energy Physics, Chinese Academy of Sciences. GEXRF is a new method of instrumental analysis that not only allows determination of the film composition, but also provides information on depth distributions and densities, thickness of films. With grazing-emission X-ray fluorescence, the opposite principle of total reflection X-ray fluorescence is utilized. In this study, X-ray fluorescence (XRF) experiments have been performed for metal thin films (Ni, Ni/Ti) on silicon substrates and a mirror-polished GaAs under the grazing exit condition. The XRF intensity was measured as a function of the exit angle for nearly normal X-ray incidence. The angular dependence of the grazing exit XRF intensity showed a sharp increase at the critical angle of K_α, K_βradiation for the metal film. The applicability of the grazing exit XRF for thin-film analysis was clearly demonstrated.

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Grazing Exit X-Ray Fluorescence Spectroscopy

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