Study of Semiconductor Super Thin Heterostructures with Synchrotron Radiation X-Ray Standing Wave Technique
- Received Date:2000-05-26
- Accepted Date:1900-01-01
- Available Online:2001-06-05
Abstract:The X ray standing wave experiment method is established with the double-crystal monochromator and precision 2-circle goniometer at Beijing Synchrotron Radiation Facility. It is used combined with the X-ray diffraction, to investigate the heterostructure of super thin Ge atomic layer within Si crystals. The results show that the GexSi1-xalloy layer with average x=0.13 was formed in the Si crystal sample due to the segregation of Ge atoms during the preparation. Due to the diffusion of Ge atoms to the crystal surface, the GexSi1-xalloy layer was disappeared and nearly pure Ge layer was formed on the Si crystal surface after annealing at 650℃.

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